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Lijian Meng
Lijian Meng
Professor of Physics at ISEP
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Investigations of titanium oxide films deposited by dc reactive magnetron sputtering in different sputtering pressures
LJ Meng, MP dos Santos
Thin Solid Films 226 (1), 22-29, 1993
3041993
Properties of indium tin oxide films prepared by rf reactive magnetron sputtering at different substrate temperature
L Meng, MP Dos Santos
Thin solid films 322 (1-2), 56-62, 1998
2201998
Bifacial dye-sensitized solar cells: A strategy to enhance overall efficiency based on transparent polyaniline electrode
J Wu, Y Li, Q Tang, G Yue, J Lin, M Huang, L Meng
Scientific reports 4 (1), 4028, 2014
2182014
The effect of substrate temperature on the properties of dc reactive magnetron sputtered titanium oxide films
L Meng, M Andritschky, MP Dos Santos
Thin Solid Films 223 (2), 242-247, 1993
1771993
Amorphous ITO thin films prepared by DC sputtering for electrochromic applications
V Teixeira, HN Cui, LJ Meng, E Fortunato, R Martins
Thin Solid Films 420, 70-75, 2002
1442002
Study of the structural properties of ZnO thin films by x-ray photoelectron spectroscopy
LJ Meng, CPM de Sá, MP Dos Santos
Applied surface science 78 (1), 57-61, 1994
1361994
Properties of indium tin oxide (ITO) films prepared by rf reactive magnetron sputtering at different pressures
L Meng, MP Dos Santos
Thin solid films 303 (1-2), 151-155, 1997
1221997
Optical and structural properties of vanadium pentoxide films prepared by dc reactive magnetron sputtering
LJ Meng, RA Silva, HN Cui, V Teixeira, MP Dos Santos, Z Xu
Thin solid films 515 (1), 195-200, 2006
1212006
Study of annealed indium tin oxide films prepared by rf reactive magnetron sputtering
L Meng, A Macarico, R Martins
Vacuum 46 (7), 673-680, 1995
1191995
Characterisation of ZrO2 films prepared by rf reactive sputtering at different O2 concentrations in the sputtering gases
P Gao, LJ Meng, MP Dos Santos, V Teixeira, M Andritschky
Vacuum 56 (2), 143-148, 2000
1172000
Characterization of titanium nitride films prepared by dc reactive magnetron sputtering at different nitrogen pressures
LJ Meng, MP Dos Santos
Surface and Coatings Technology 90 (1-2), 64-70, 1997
1151997
Structure and optical properties of ZnO: V thin films with different doping concentrations
L Wang, L Meng, V Teixeira, S Song, Z Xu, X Xu
Thin Solid Films 517 (13), 3721-3725, 2009
1092009
Direct current reactive magnetron sputtered zinc oxide thin films—the effect of the sputtering pressure
LJ Meng, MP Dos Santos
Thin Solid Films 250 (1-2), 26-32, 1994
1081994
Annealing effect on ITO thin films prepared by microwave-enhanced dc reactive magnetron sputtering for telecommunication applications
LJ Meng, F Placido
Surface and Coatings Technology 166 (1), 44-50, 2003
892003
Influence of sputtering pressure on the structure and properties of ZrO2 films prepared by rf reactive sputtering
P Gao, LJ Meng, MP Dos Santos, V Teixeira, M Andritschky
Applied surface science 173 (1-2), 84-90, 2001
742001
Influence of oxygen/argon pressure ratio on the morphology, optical and electrical properties of ITO thin films deposited at room temperature
HN Cui, V Teixeira, LJ Meng, R Martins, E Fortunato
Vacuum 82 (12), 1507-1511, 2008
732008
Thermochromic properties of vanadium oxide films prepared by dc reactive magnetron sputtering
HN Cui, V Teixeira, LJ Meng, R Wang, JY Gao, E Fortunato
Thin Solid Films 516 (7), 1484-1488, 2008
692008
Highly efficient and stable saline water electrolysis enabled by self‐supported nickel‐iron phosphosulfide nanotubes with heterointerfaces and under‐coordinated metal active sites
Z Yu, Y Li, V Martin‐Diaconescu, L Simonelli, J Ruiz Esquius, I Amorim, ...
Advanced Functional Materials 32 (38), 2206138, 2022
652022
Structure effect on electrical properties of ITO films prepared by RF reactive magnetron sputtering
LJ Meng, MP Dos Santos
Thin Solid Films 289 (1-2), 65-69, 1996
641996
Zinc oxide films prepared by dc reactive magnetron sputtering at different substrate temperatures
LJ Meng, M Andritschky, MP Dos Santos
Vacuum 45 (1), 19-22, 1994
631994
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Artigos 1–20