| Investigations of titanium oxide films deposited by dc reactive magnetron sputtering in different sputtering pressures LJ Meng, MP dos Santos Thin Solid Films 226 (1), 22-29, 1993 | 304 | 1993 |
| Properties of indium tin oxide films prepared by rf reactive magnetron sputtering at different substrate temperature L Meng, MP Dos Santos Thin solid films 322 (1-2), 56-62, 1998 | 228 | 1998 |
| Bifacial dye-sensitized solar cells: A strategy to enhance overall efficiency based on transparent polyaniline electrode J Wu, Y Li, Q Tang, G Yue, J Lin, M Huang, L Meng Scientific reports 4 (1), 4028, 2014 | 203 | 2014 |
| The effect of substrate temperature on the properties of dc reactive magnetron sputtered titanium oxide films L Meng, M Andritschky, MP Dos Santos Thin Solid Films 223 (2), 242-247, 1993 | 178 | 1993 |
| Amorphous ITO thin films prepared by DC sputtering for electrochromic applications V Teixeira, HN Cui, LJ Meng, E Fortunato, R Martins Thin Solid Films 420, 70-75, 2002 | 149 | 2002 |
| Study of the structural properties of ZnO thin films by x-ray photoelectron spectroscopy LJ Meng, CPM de Sá, MP Dos Santos Applied surface science 78 (1), 57-61, 1994 | 139 | 1994 |
| Optical and structural properties of vanadium pentoxide films prepared by dc reactive magnetron sputtering LJ Meng, RA Silva, HN Cui, V Teixeira, MP Dos Santos, Z Xu Thin solid films 515 (1), 195-200, 2006 | 128 | 2006 |
| Properties of indium tin oxide (ITO) films prepared by rf reactive magnetron sputtering at different pressures L Meng, MP Dos Santos Thin solid films 303 (1-2), 151-155, 1997 | 125 | 1997 |
| Study of annealed indium tin oxide films prepared by rf reactive magnetron sputtering L Meng, A Macarico, R Martins Vacuum 46 (7), 673-680, 1995 | 121 | 1995 |
| Characterisation of ZrO2 films prepared by rf reactive sputtering at different O2 concentrations in the sputtering gases P Gao, LJ Meng, MP Dos Santos, V Teixeira, M Andritschky Vacuum 56 (2), 143-148, 2000 | 118 | 2000 |
| Characterization of titanium nitride films prepared by dc reactive magnetron sputtering at different nitrogen pressures LJ Meng, MP Dos Santos Surface and Coatings Technology 90 (1-2), 64-70, 1997 | 118 | 1997 |
| Direct current reactive magnetron sputtered zinc oxide thin films—the effect of the sputtering pressure LJ Meng, MP Dos Santos Thin Solid Films 250 (1-2), 26-32, 1994 | 110 | 1994 |
| Structure and optical properties of ZnO: V thin films with different doping concentrations L Wang, L Meng, V Teixeira, S Song, Z Xu, X Xu Thin Solid Films 517 (13), 3721-3725, 2009 | 109 | 2009 |
| Highly efficient and stable saline water electrolysis enabled by self‐supported nickel‐iron phosphosulfide nanotubes with heterointerfaces and under‐coordinated metal active sites Z Yu, Y Li, V Martin‐Diaconescu, L Simonelli, J Ruiz Esquius, I Amorim, ... Advanced Functional Materials 32 (38), 2206138, 2022 | 101 | 2022 |
| Annealing effect on ITO thin films prepared by microwave-enhanced dc reactive magnetron sputtering for telecommunication applications LJ Meng, F Placido Surface and Coatings Technology 166 (1), 44-50, 2003 | 87 | 2003 |
| Influence of sputtering pressure on the structure and properties of ZrO2 films prepared by rf reactive sputtering P Gao, LJ Meng, MP Dos Santos, V Teixeira, M Andritschky Applied surface science 173 (1-2), 84-90, 2001 | 76 | 2001 |
| Influence of oxygen/argon pressure ratio on the morphology, optical and electrical properties of ITO thin films deposited at room temperature HN Cui, V Teixeira, LJ Meng, R Martins, E Fortunato Vacuum 82 (12), 1507-1511, 2008 | 75 | 2008 |
| Iridium–iron diatomic active sites for efficient bifunctional oxygen electrocatalysis Z Yu, C Si, AP LaGrow, Z Tai, WA Caliebe, A Tayal, MJ Sampaio, ... ACS Catalysis 12 (15), 9397-9409, 2022 | 73 | 2022 |
| Thermochromic properties of vanadium oxide films prepared by dc reactive magnetron sputtering HN Cui, V Teixeira, LJ Meng, R Wang, JY Gao, E Fortunato Thin Solid Films 516 (7), 1484-1488, 2008 | 67 | 2008 |
| Structure effect on electrical properties of ITO films prepared by RF reactive magnetron sputtering LJ Meng, MP Dos Santos Thin Solid Films 289 (1-2), 65-69, 1996 | 64 | 1996 |
Vasco TeixeiraAssociate Professor, University of Minho, Physics Department, Braga, PortugalVerified email at fisica.uminho.pt
