| Investigations of titanium oxide films deposited by dc reactive magnetron sputtering in different sputtering pressures LJ Meng, MP dos Santos Thin Solid Films 226 (1), 22-29, 1993 | 304 | 1993 |
| Properties of indium tin oxide films prepared by rf reactive magnetron sputtering at different substrate temperature L Meng, MP Dos Santos Thin solid films 322 (1-2), 56-62, 1998 | 220 | 1998 |
| The effect of substrate temperature on the properties of dc reactive magnetron sputtered titanium oxide films L Meng, M Andritschky, MP Dos Santos Thin Solid Films 223 (2), 242-247, 1993 | 177 | 1993 |
| Study of the structural properties of ZnO thin films by x-ray photoelectron spectroscopy LJ Meng, CPM de Sá, MP Dos Santos Applied surface science 78 (1), 57-61, 1994 | 136 | 1994 |
| Properties of indium tin oxide (ITO) films prepared by rf reactive magnetron sputtering at different pressures L Meng, MP Dos Santos Thin solid films 303 (1-2), 151-155, 1997 | 122 | 1997 |
| Optical and structural properties of vanadium pentoxide films prepared by dc reactive magnetron sputtering LJ Meng, RA Silva, HN Cui, V Teixeira, MP Dos Santos, Z Xu Thin solid films 515 (1), 195-200, 2006 | 121 | 2006 |
| Characterisation of ZrO2 films prepared by rf reactive sputtering at different O2 concentrations in the sputtering gases P Gao, LJ Meng, MP Dos Santos, V Teixeira, M Andritschky Vacuum 56 (2), 143-148, 2000 | 117 | 2000 |
| Characterization of titanium nitride films prepared by dc reactive magnetron sputtering at different nitrogen pressures LJ Meng, MP Dos Santos Surface and Coatings Technology 90 (1-2), 64-70, 1997 | 115 | 1997 |
| Direct current reactive magnetron sputtered zinc oxide thin films—the effect of the sputtering pressure LJ Meng, MP Dos Santos Thin Solid Films 250 (1-2), 26-32, 1994 | 108 | 1994 |
| Influence of sputtering pressure on the structure and properties of ZrO2 films prepared by rf reactive sputtering P Gao, LJ Meng, MP Dos Santos, V Teixeira, M Andritschky Applied surface science 173 (1-2), 84-90, 2001 | 74 | 2001 |
| Structure effect on electrical properties of ITO films prepared by RF reactive magnetron sputtering LJ Meng, MP Dos Santos Thin Solid Films 289 (1-2), 65-69, 1996 | 64 | 1996 |
| Zinc oxide films prepared by dc reactive magnetron sputtering at different substrate temperatures LJ Meng, M Andritschky, MP Dos Santos Vacuum 45 (1), 19-22, 1994 | 63 | 1994 |
| Growth and characterisation of cadmium sulphide nanocrystals embedded in silicon dioxide films AG Rolo, LG Vieira, MJM Gomes, JL Ribeiro, MS Belsley, MP Dos Santos Thin solid films 312 (1-2), 348-353, 1998 | 59 | 1998 |
| The influence of oxygen partial pressure on the properties of DC reactive magnetron sputtered titanium oxide films LJ Meng, MP Dos Santos Applied surface science 68 (3), 319-325, 1993 | 54 | 1993 |
| A study of the optical properties of titanium oxide films prepared by dc reactive magnetron sputtering LJ Meng, V Teixeira, HN Cui, F Placido, Z Xu, MP dos Santos Applied surface science 252 (22), 7970-7974, 2006 | 51 | 2006 |
| The effect of the ion beam energy on the properties of indium tin oxide thin films prepared by ion beam assisted deposition LJ Meng, J Gao, MP Dos Santos, X Wang, T Wang Thin Solid Films 516 (7), 1365-1369, 2008 | 50 | 2008 |
| Deposition and properties of titanium nitride films produced by dc reactive magnetron sputtering LJ Meng, A Azevedo, MP Dos Santos Vacuum 46 (3), 233-239, 1995 | 47 | 1995 |
| Study of porosity of titanium oxide films by X-ray photoelectron spectroscopy and IR transmittance LJ Meng, CPM de Sá, MP Dos Santos Thin Solid Films 239 (1), 117-122, 1994 | 45 | 1994 |
| Study of ZrO2/Al2O3 multilayers P Gao, LJ Meng, MP Dos Santos, V Teixeira, M Andritschky Vacuum 64 (3-4), 267-273, 2002 | 39 | 2002 |
| Study of ZrO2–Y2O3 films prepared by rf magnetron reactive sputtering P Gao, LJ Meng, MP Dos Santos, V Teixeira, M Andritschky Thin solid films 377, 32-36, 2000 | 37 | 2000 |
Lijian MengProfessor of Physics at ISEPEmail confirmado em isep.ipp.pt
