Manuel Pereira dos Santos
Manuel Pereira dos Santos
Professor Catedrático de Física, Universidade de Évora, investigador no ICT - Polo de Évora
Email confirmado em uevora.pt
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Investigations of titanium oxide films deposited by dc reactive magnetron sputtering in different sputtering pressures
LJ Meng, MP dos Santos
Thin Solid Films 226 (1), 22-29, 1993
2781993
Properties of indium tin oxide films prepared by rf reactive magnetron sputtering at different substrate temperature
L Meng, MP Dos Santos
Thin Solid Films 322 (1-2), 56-62, 1998
1961998
The effect of substrate temperature on the properties of dc reactive magnetron sputtered titanium oxide films
L Meng, M Andritschky, MP Dos Santos
Thin Solid Films 223 (2), 242-247, 1993
1671993
Properties of indium tin oxide (ITO) films prepared by rf reactive
L Meng, MP Dos Santos
Thin solid films 303, 151-155, 1997
1121997
Study of the structural properties of ZnO thin films by x-ray photoelectron spectroscopy
LJ Meng, CPM de Sá, MP Dos Santos
Applied surface science 78 (1), 57-61, 1994
1081994
Direct current reactive magnetron sputtered zinc oxide thin films—the effect of the sputtering pressure
LJ Meng, MP Dos Santos
Thin Solid Films 250 (1-2), 26-32, 1994
1041994
Characterisation of ZrO2 films prepared by rf reactive sputtering at different O2 concentrations in the sputtering gases
P Gao, LJ Meng, MP Dos Santos, V Teixeira, M Andritschky
Vacuum 56 (2), 143-148, 2000
992000
Optical and structural properties of vanadium pentoxide films prepared by dc reactive magnetron sputtering
LJ Meng, RA Silva, HN Cui, V Teixeira, MP Dos Santos, Z Xu
Thin solid films 515 (1), 195-200, 2006
902006
Characterization of titanium nitride films prepared by dc reactive magnetron sputtering at different nitrogen pressures
LJ Meng, MP Dos Santos
Surface and Coatings Technology 90 (1-2), 64-70, 1997
881997
Influence of sputtering pressure on the structure and properties of ZrO2 films prepared by rf reactive sputtering
P Gao, LJ Meng, MP Dos Santos, V Teixeira, M Andritschky
Applied surface science 173 (1-2), 84-90, 2001
632001
Structure effect on electrical properties of ITO films prepared by RF reactive magnetron sputtering
LJ Meng, MP Dos Santos
Thin Solid Films 289 (1-2), 65-69, 1996
581996
Zinc oxide films prepared by dc reactive magnetron sputtering at different substrate temperatures
LJ Meng, M Andritschky, MP Dos Santos
Vacuum 45 (1), 19-22, 1994
581994
Growth and characterisation of cadmium sulphide nanocrystals embedded in silicon dioxide films
AG Rolo, LG Vieira, MJM Gomes, JL Ribeiro, MS Belsley, MP Dos Santos
Thin solid films 312 (1-2), 348-353, 1998
511998
The influence of oxygen partial pressure on the properties of DC reactive magnetron sputtered titanium oxide films
LJ Meng, MP Dos Santos
Applied surface science 68 (3), 319-325, 1993
491993
A study of the optical properties of titanium oxide films prepared by dc reactive magnetron sputtering
LJ Meng, V Teixeira, HN Cui, F Placido, Z Xu, MP dos Santos
Applied surface science 252 (22), 7970-7974, 2006
482006
Study of ZrO2–Y2O3 films prepared by rf magnetron reactive sputtering
P Gao, LJ Meng, MP Dos Santos, V Teixeira, M Andritschky
Thin solid films 377, 32-36, 2000
472000
The effect of the ion beam energy on the properties of indium tin oxide thin films prepared by ion beam assisted deposition
LJ Meng, J Gao, MP Dos Santos, X Wang, T Wang
Thin Solid Films 516 (7), 1365-1369, 2008
432008
Study of porosity of titanium oxide films by X-ray photoelectron spectroscopy and IR transmittance
LJ Meng, CPM de Sá, MP Dos Santos
Thin Solid Films 239 (1), 117-122, 1994
401994
Deposition and properties of titanium nitride films produced by dc reactive magnetron sputtering
LJ Meng, A Azevedo, MP Dos Santos
Vacuum 46 (3), 233-239, 1995
391995
Study of ZrO2/Al2O3 multilayers
P Gao, LJ Meng, MP Dos Santos, V Teixeira, M Andritschky
Vacuum 64 (3-4), 267-273, 2002
362002
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