Comparison of solid-state thermionic refrigeration with thermoelectric refrigeration MD Ulrich, PA Barnes, CB Vining
Journal of Applied Physics 90 (3), 1625-1631, 2001
95 2001 Intrinsic electronically active defects in transition metal elemental oxides G Lucovsky, H Seo, S Lee, LB Fleming, MD Ulrich, J Lüning, P Lysaght, ...
Japanese journal of applied physics 46 (4S), 1899, 2007
76 2007 Influence of substrate temperature on epitaxial copper phthalocyanines studied by photoemission spectroscopy TS Ellis, KT Park, SL Hulbert, MD Ulrich, JE Rowe
Journal of applied physics 95 (3), 982-988, 2004
73 2004 Local bonding analysis of the valence and conduction band features of TiO2 L Fleming, CC Fulton, G Lucovsky, JE Rowe, MD Ulrich, J Lüning
Journal of Applied Physics 102 (3), 2007
68 2007 Interaction of metallophthalocyanines (MPc, M= Co, Ni) on Au (001): Ultraviolet photoemission spectroscopy and low energy electron diffraction study TS Ellis, KT Park, MD Ulrich, SL Hulbert, JE Rowe
Journal of applied physics 100 (9), 2006
52 2006 Soft x-ray photoelectron spectroscopy of high-k gate-dielectric structures MD Ulrich, JG Hong, JE Rowe, G Lucovsky, ASY Chan, TE Madey
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003
40 2003 Differences Between Charge Trapping States in Irradiated Nano-Crystalline HfO and Non-Crystalline Hf Silicates G Lucovsky, DM Fleetwood, S Lee, H Seo, RD Schrimpf, JA Felix, J Lning, ...
IEEE transactions on nuclear science 53 (6), 3644-3648, 2006
39 2006 Bonding and structure of ultrathin yttrium oxide films for Si field effect transistor gate dielectric applications MD Ulrich, JE Rowe, D Niu, GN Parsons
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003
31 2003 Surface atom core-level shifts of clean and oxygen-covered ASY Chan, GK Wertheim, H Wang, MD Ulrich, JE Rowe, TE Madey
Physical Review B 72 (3), 035442, 2005
26 2005 Solutions to the Fermi-Dirac integrals in semiconductor physics using Polylogarithms MD Ulrich, WF Seng, PA Barnes
Journal of Computational Electronics 1, 431-434, 2002
24 2002 Near-edge absorption fine structure and UV photoemission spectroscopy studies of aligned single-walled carbon nanotubes on Si (100) substrates L Fleming, MD Ulrich, K Efimenko, J Genzer, ASY Chan, TE Madey, SJ Oh, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
17 2004 Magnetoelectric oxide films for spin manipulation in graphene SC Stuart, B Gray, D Nevola, L Su, E Sachet, M Ulrich, DB Dougherty
physica status solidi (RRL)–Rapid Research Letters 10 (3), 242-247, 2016
15 2016 Defect states in HfO2 on deposited on Ge (1 1 1) and Ge (1 0 0) substrates G Lucovsky, H Seo, JP Long, KB Chung, R Vasic, M Ulrich
Applied surface science 255 (13-14), 6443-6450, 2009
14 2009 Interface electronic structure of alloys for Si-field-effect transistor gate dielectric applications MD Ulrich, RS Johnson, JG Hong, JE Rowe, G Lucovsky, JS Quinton, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002
14 2002 Effect of contact resistance in solid-state thermionic refrigeration MD Ulrich, PA Barnes, CB Vining
Journal of applied physics 92 (1), 245-247, 2002
11 2002 Intrinsic bonding defects in transition metal elemental oxides G Lucovsky, H Seo, LB Fleming, MD Ulrich, J Lüning, P Lysaght, ...
Microelectronics Reliability 46 (9-11), 1623-1628, 2006
10 2006 Comparison of ultrathin SiO2∕ Si (100) and SiO2∕ Si (111) interfaces from soft x-ray photoelectron spectroscopy MD Ulrich, JE Rowe, JW Keister, H Niimi, L Fleming, G Lucovsky
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006
10 2006 Smooth MgO films grown on graphite and graphene by pulsed laser deposition SC Stuart, E Satchet, A Sandin, JP Maria, JEJ Rowe, DB Dougherty, ...
Journal of Vacuum Science & Technology B 31 (5), 2013
9 2013 Graphene-based Nanoelectronics OM Nayfeh, ML Chin, M Ervin, J Wilson, T Ivanov, R Proie, BM Nichols, ...
Army Research Laboratory, ARL-TR-5451 46, 2011
8 2011 Predeposition plasma nitridation process applied to Ge substrates to passivate interfaces between crystalline-Ge substrates and Hf-based high- dielectrics G Lucovsky, JP Long, KB Chung, H Seo, B Watts, R Vasic, MD Ulrich
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009
8 2009