Controlling nanocrystal superlattice symmetry and shape-anisotropic interactions through variable ligand surface coverage JJ Choi, CR Bealing, K Bian, KJ Hughes, W Zhang, DM Smilgies, ... Journal of the American Chemical Society 133 (9), 3131-3138, 2011 | 249 | 2011 |
Common decomposition pathways of 1-epoxy-3-butene and 2-butenal on Pd (111) ST Marshall, CM Horiuchi, W Zhang, JW Medlin The Journal of Physical Chemistry C 112 (51), 20406-20412, 2008 | 31 | 2008 |
Effect of substrate composition on atomic layer deposition using self-assembled monolayers as blocking layers W Zhang, JR Engstrom Journal of Vacuum Science & Technology A 34 (1), 2016 | 28 | 2016 |
Selective etch of metal nitride films PM Wenyu Zhang, Liqi Wu, Shih Chung Chen, Wei Tang, Leung Kway Lee, Xinming ... US Patent App. 15/446,573, 2017 | 16* | 2017 |
Aluminum content control of TiAlN films PM Wenyu Zhang, Wei Tang, Chen-han Lin, Yixiong Yang, Yi Xu, David Thompson US Patent App. 15/462,214, 2017 | 15* | 2017 |
Investigation of submonolayer SiOX species formed from oxidation of silane on Pt (1 1 1) DC Kershner, W Zhang, JW Medlin Surface science 602 (21), 3225-3231, 2008 | 14 | 2008 |
Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof WV Tang, PF Ma, SCH Hung, M Chudzik, S Krishnan, W Zhang, ... US Patent 9,748,354, 2017 | 12 | 2017 |
Design and characterization of a microreactor for spatially confined atomic layer deposition and in situ UHV surface analysis JR Chen, W Zhang, RK Nahm, MA DiFeo, JR Engstrom Journal of Vacuum Science & Technology A 35 (6), 2017 | 9 | 2017 |
Methods of treating a substrate to form a layer thereon for application in selective deposition processes JS Kachian, J Tanskanen, W Zhang, MS Jackson, C Ke, L Wu US Patent App. 16/381,755, 2019 | 7 | 2019 |
Probing ultrathin film continuity and interface abruptness with x-ray photoelectron spectroscopy and low-energy ion scattering W Zhang, RK Nahm, PF Ma, JR Engstrom Journal of Vacuum Science & Technology A 31 (6), 2013 | 7 | 2013 |
Methods of reducing or eliminating defects in tungsten film J Guoqiang, W Tang, CC Lin, PF Ma, K Wu, V Banthia, M Chang, J Ye, ... US Patent 10,879,081, 2020 | 3 | 2020 |
Methods for selective deposition using self assembled monolayers C Ke, W Zhang, L Wu US Patent App. 16/535,499, 2020 | 2 | 2020 |
Methods and apparatus for doping engineering and threshold voltage tuning by integrated deposition of titanium nitride and aluminum films Y Yang, PF Ma, WV Tang, W Zhang, SC Chen, CH Lin, CC Lin, Y Xu, ... US Patent 10,665,450, 2020 | 1 | 2020 |
Method for forming a layer W Wang, H Dai, CS Ngai, L Wu, W Zhang, Y Chen, H Chen, KT Wong, ... US Patent 10,957,590, 2021 | | 2021 |
Methods of increasing selectivity for selective etch processes W Zhang, Y Yang, MD Sanchez, J Guoqiang, WV Tang, PF Ma US Patent 10,755,947, 2020 | | 2020 |
Methods to improve selectivity in preferential etch WZ Paul Ma, Guoqiang Jian, Mario Sanchez, Wei Tang, Yixiong Yang US Patent App. 62/665,497, 2018 | | 2018 |
Reducing or eliminating Tungsten silky defects PM Guoqiang Jian, Wei Tang, Chi-chou Lin, Wenyu Zhang, Kai Wu, Vikash ... US Patent App. 62/590,053, 2017 | | 2017 |
Multi-threshold voltage structures with a Lanthanum Nitride film and methods of formation thereof PM Wei Tang, , Steven Hung, Michael Chudzik, Siddarth Krishnan, Wenyu Zhang ... US Patent 09,748,354, 2017 | | 2017 |
Methods and apparatus for doping engineering and threshold voltage tuning by integrated deposition of Titanium and Aluminum films PM Wenyu Zhang, Yixiong Yang, Wei Tang, Shih Chung Chen, Chen-han Lin, Chi ... US Patent App. 62/547,754, 2017 | | 2017 |
Study Of Atomic Layer Deposition: Thin Film Continuity And Techniques To Modulate Surface Reactivity W Zhang | | 2016 |